EDI-series


Application use:

Solder resist formation:

  • FC-BGA substrates/FC-CSP substrates
  • Various module substrates such as AiP
  • HDI substrates

Exposure of various other sensitive materials

  • Photovia, coverlay, etc.

Features:

  • Realizes resist SRO of φ40µm to accommodate miniaturization of package substrates. (EDi-5308)
  • New UV lamp light source with greatly improved light intensity achieves up to 10% higher productivity than conventional models. (EDi-8308)
  • The broadband wavelength of the UV lamp light source enables the use of a wide range of photo sensitive materials.
  • High positional accuracy of 6 µm is achieved with the D-A-T high-precision compensation technology and a new high-precision stage (EDi-5308).
  • Die by Die alignment function solves the die shift problem of FO-PLP (optional function)
  • Supports large substrates up to 25 “X32” (EDi-8310)

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