Plasma Desmear Batch

NEMS Tech.

Unique plasma technology, which is integrated with high-voltage electrical field, ICP and HCP simultaneously
The direction of ion mobility can be controlled
ICP & HCP are generated at the same time and it can substantially increase the plasma density as well as the process speed
By employing water-cooling electrodes, the resistance of electrode surface can remain the same and thus increase the process stability
Multiple processing gas selectivity
Decrease the maintenance time and operation costs by using PLC computer
High automation and operator friendly design
Dependant on the customer’s requirements, the machine will be produced at special specifications
Chamber capability : 18 ~ 36 panels (Type I), 24~48 panels (Type II)

Excellent Performance

High desmear / drilling uniformity (about ±10% in general)
Very high desmear / drilling efficiency
Multiple processing gases (Ar, CF₄, O₂, N₂) capable of achieving the best surface treatment effects

Applications