Plasma Asher


  • High treatment uniformity
  • Be able to conduct 6 or 8 inches wafer
  • Up to 25 ~ 50 wafers per load
  • Cycle time about 20 ~ 25 min

Featuring Designs

  • High density plasma system ( ICP)
  • Damage free design
  • Electrodes with water-cooling

Request information material by e-mail